Wake up to calmer, more resilient skin with the Cica Overnight Mask. Specially formulated to deeply hydrate and strengthen your skin barrier, this lightweight gel-textured mask revitalises your complexion while you sleep.
Infused with soothing Centella Asiatica (Cica) to target signs of discomfort, a softening Sugar Complex to lock in moisture, and barrier-protecting Bacillus Ferment, this nourishing mask restores balance for a brighter, healthier-looking complexion.
Key Ingredients:
- Centella Asiatica (Cica) : Also known as ‘Tiger Grass’ in traditional Indian medicine, Centella Asiatica is renowned for its calming properties and ability to boost the skin’s natural hyaluronic acid production for deep hydration. A powerhouse ingredient for promoting a resilient, healthy-looking complexion!
- Bacillus Ferment : This unique biomimetic ingredient boosts hydration, strengthens the skin barrier, and reduces moisture loss. Ideal for stressed or sensitive skin, it soothes redness, boosts elasticity, and strengthens the skin’s protective barrier.
- Sugar Complex : This nourishing complex delivers deep hydration by distributing moisture across all skin layers and enhancing hyaluronic acid production. It helps to protect the delicate skin barrier, minimise the appearance of fine lines and encourage softer, smoother skin.
Produced in the U.K.
This product is suitable for vegans. Q+A products are not tested on animals, and never will be.
Ingredients: Aqua (Water), Aloe Barbadensis (Aloe Vera) Leaf Juice, Glycerin, C15-19 Alkane, Caprylic/Capric Triglyceride, Betaine, Propanediol, Coco-Caprylate/Caprate, Xylitylglucoside, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Centella Asiatica (Cica) Extract, Tripeptide-29, Bacillus Ferment, Bisabolol, Sodium Hyaluronate, Shea Butter Polyglyceryl-4 Esters, Anhydroxylitol, Xylitol, 1-Methylhydantoin-2-Imide, Lonicera Caprifolium (Honeysuckle) Flower Extract, Lonicera Japonica (Honeysuckle) Flower Extract, Glucose, Sodium Gluconate, Glyceryl Acrylate/Acrylic Acid Copolymer, Leuconostoc/Radish Root Ferment Filtrate, Ethylhexylglycerin, Phenoxyethanol, Sodium Hydroxide, Citric Acid.
Apply evenly to clean skin after moisturising. Leave on overnight and rinse off in the morning. Use 1-2 times per week.
Warnings: Avoid contact with eyes. Discontinue use if irritation occurs. For external use only.
